Materials & Optical Foundations
Nanofilm provides high-purity substrates engineered for the most demanding lithographic, imaging, and semiconductor applications. By maintaining an extensive inventory of industry-standard materials and offering in-house precision fabrication, we ensure your project begins with a foundation of absolute surface integrity and thermal stability.
Soda Lime Glass (SLG)
The Industry Standard for General-Purpose Imaging.
Our Soda Lime substrates are selected for their excellent chemical durability and cost-effective performance in broad-spectrum optical applications. Every plate undergoes multi-stage aqueous cleaning in our Class 100/10 environment to ensure a particulate-free surface ready for thin-film deposition.
Technical Specifications
| Property | Metric Value | Unit |
|---|---|---|
| Refractive Index (nd) | 1.523 | @ 589.3 nm |
| Coefficient of Thermal Expansion | 9.35×10−6 | 20∘C to 300∘C |
| Softening Point | 726 | ∘C |
| Density | 2.48 | g/cm3 |
| Standard Surface Flatness | <5μm | Per 4″ Area |
Standard Inventory Dimensions
- Squares: 2.5″ x 2.5″ | 3.0″ x 3.0″ | 4.0″ x 4.0″ | 5.0″ x 5.0″ | 7.0″ x 7.0″
- Wafers: 100mm | 150mm | 200mm
- Standard Thicknesses: 0.060″ | 0.090″ | 0.120″ | 0.250″
Synthetic Fused Silica (Quartz)
High-Performance Solutions for Deep-UV & Thermal Extremes.
For applications requiring superior UV transmission and near-zero thermal expansion, Nanofilm provides premium Synthetic Fused Silica. These substrates are ideal for high-power laser optics and high-resolution semiconductor mask making.
Performance Advantages
- Deep-UV Transparency: Exceptional transmission down to 193 nm.
- Extreme Thermal Stability: A coefficient of expansion of 0.55×10−6/∘C, ensuring dimensional stays constant under high-intensity exposure.
- Chemical Purity: Negligible metallic impurities, making it ideal for contamination-sensitive environments.
Electronic-Grade Silicon
The Crystalline Foundation for MEMS & Microelectronics.
We stock high-purity Silicon substrates optimized for vacuum-based thin-film applications. Available in both P-type and N-type orientations, these substrates are prepared for seamless integration into semiconductor fabrication workflows.
- Primary Diameters: 100mm (4″) and 150mm (6″).
- Surface Finish: Single-side or double-side polished (SSP/DSP) options.
- Custom Sizing: Precision dicing available for non-standard rectangular or square geometries.
Precision Fabrication Services
Custom Solutions Tailored to Your Design.
Nanofilm eliminates the need for secondary processing by delivering “ready-to-use” substrates customized to your proprietary specifications.
- Bespoke Dimensional Scaling: CNC-controlled dicing and shaping for unique geometries.
- Optical-Grade Polishing: Sub-angstrom surface finishes to maximize film adhesion and minimize light scatter.
- Edge Conditioning: Specialized beveling and profiling to reduce mechanical stress and particulate shedding during automated handling.
- Flatness Verification: Advanced interferometric mapping provided for mission-critical tolerance requirements.
Technical Consultation
Not sure which material is right for your wavelength or thermal environment? Our engineering team provides data-driven material selection support to ensure your thin-film performance meets its target metrics.
[Request a Material Data Sheet] | [Inquire About Custom Sizing]
Substrate-Material-Specifications