Contamination-Controlled Preparation

The performance of a photomask blank is determined before the first layer is ever deposited. All critical processing occurs within our Certified Class 100/10 Cleanroom, where we utilize multi-stage aqueous and ultrasonic cleaning to ensure an atomically clean surface.

  • Yield Optimization: By eliminating microscopic particulates and organic residues, we prevent the formation of pin-holes and film defects that can compromise your final patterns.
  • Surface Activation: Our cleaning protocols include specialized pre-treatment to maximize thin-film adhesion, ensuring the long-term durability of the coating during aggressive chemical processing.
  • Environmentally Stable Handling: From final rinse to hermetic sealing, your materials remain in a controlled atmosphere to prevent environmental degradation.